Navegação Engenharias por Assunto "Oxigênio"
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Amorphization/recrystallization of buried amorphous silicon layer induced by oxygen ion implantation
(2004) [Artigo de periódico]In this paper we discuss the structural modifications observed in a buried amorphous Si (α-Si) layer containing high oxygen concentration level (up to ~ 3 at.%) after being implanted at elevated temperature with 16O+ ions. ...