Listar por tema "Fronteira entre semicondutor isolante"

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    • Integrity of hafnium silicate/silicon dioxide ultrathin films on Si 

      Morais, Jonder; Miotti, Leonardo; Soares, Gabriel Vieira; Teixeira, Sergio Ribeiro; Pezzi, Rafael Peretti; Bastos, Karen Paz; Baumvol, Israel Jacob Rabin; Rotondaro, Antonio L.P.; Chambers, Jim J.; Visokay, Mark R.; Colombo, Luigi (2002) [Artículo de periódico]
      Rapid thermal annealing at 1000 °C of (HfO2)12x(SiO2)x pseudobinary alloy films deposited on Si were performed in N2 or O2 atmospheres. The effects on the atomic transport, structure, and composition were investigated using ...