Structural and magnetic behavior of ar+-implanted co/pd multilayers : interfacial mixing

Abstract

The magnetization behavior of Co/Pd multilayers has been analyzed as a function of the degree of interfacial mixing among the Co and Pd layers. Controlled atomic mixing was induced by low-dose and low-flux ion implantation and a follow-up of the structural status of the samples was made by simulation of the high-angle x-ray-diffraction data. Values of the saturation magnetization as a function of the broadness of Co concentration profile are presented and explained by a simple model based on the parameters obtained from the x-ray simulations.