Magnetoresistance in rf-sputtered(nife/cu/co/cu) spin-valve multilayers
dc.contributor.author | Lottis, Daniel Kurt | pt_BR |
dc.contributor.author | Fert, Albert R. | pt_BR |
dc.contributor.author | Morel, Robert | pt_BR |
dc.contributor.author | Pereira, Luis Gustavo | pt_BR |
dc.contributor.author | Jacquet, J.C. | pt_BR |
dc.contributor.author | Galtier, P. | pt_BR |
dc.contributor.author | Coutellier, J.M. | pt_BR |
dc.contributor.author | Valet, Tierry | pt_BR |
dc.date.accessioned | 2014-05-20T02:04:52Z | pt_BR |
dc.date.issued | 1993 | pt_BR |
dc.identifier.issn | 0021-8979 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/95415 | pt_BR |
dc.description.abstract | A study of the vtiation of the magnetoresistancein (Ni80Fe20/Cu/Co/Cu) multilayers with the thicknesses tNiFe, tcO, and &;cu of each type of component layer has been performed. The magnetoresistance (MR), which at 4 .2 K is larger than 20% for many samples, has been measured for fields applied both parallel and perpendicular to the current. This allows a direct measurement of the anisotropic magnetorestistance as well as an estimate of the spin-valve contribution to the total MR. The dependence of the MR on tcu indicates the presence of an oscillatory interlayer exchange c.oupling through the Cu layers with a period of about 12 Å. The dependence of the MR on tNiFe and tcO was studied at tcu=50 Å, for which the coupling is negligible. In this limit, the variation of the MR is dominated by the thickness dependenceo f the NiFe and Co component layer coercivitie-s, which determine the degree of antiparallel alignement obtained during magnetization reversal. | en |
dc.format.mimetype | application/pdf | pt_BR |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | Journal of applied physics. Woodbury. Vol. 73, no. 10 (May 1993), p. 5515-5517 | pt_BR |
dc.rights | Open Access | en |
dc.subject | Física da matéria condensada | pt_BR |
dc.subject | Magnetorresistência | pt_BR |
dc.subject | Implantação de íons | pt_BR |
dc.title | Magnetoresistance in rf-sputtered(nife/cu/co/cu) spin-valve multilayers | pt_BR |
dc.type | Artigo de periódico | pt_BR |
dc.identifier.nrb | 000256791 | pt_BR |
dc.type.origin | Estrangeiro | pt_BR |
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