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Xerogel p-anisidinapropilsílica : estudo da estabilidade térmica e da resistência à lixiviação com solventes

dc.contributor.authorFranken, Leonardopt_BR
dc.contributor.authorSantos, Lisiane Santos dospt_BR
dc.contributor.authorCaramão, Elina Bastospt_BR
dc.contributor.authorCosta, Tania Maria Haaspt_BR
dc.contributor.authorBenvenutti, Edilson Valmirpt_BR
dc.date.accessioned2013-07-03T01:42:41Zpt_BR
dc.date.issued2002pt_BR
dc.identifier.issn0100-4042pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/72975pt_BR
dc.description.abstractThe xerogel p-anisidinepropylsilica was obtained. This solid presents some residual paraffin and also a small fraction of high organofunctionalized material that was leached in polar solvent. The xerogel purification could be achieved by exhaustively washing with hexane and dichloromethane solvents, or submitting the xerogel to thermal treatment up to 300 ºC, in vacuum. The resulting purified xerogel material present an appreciable thermal stability and resistance to leaching by solvents.en
dc.format.mimetypeapplication/pdf
dc.language.isoporpt_BR
dc.relation.ispartofQuímica nova. São Paulo. Vol. 25, n. 4 (2002), p. 563-566pt_BR
dc.rightsOpen Accessen
dc.subjectP-anisidineen
dc.subjectGel de silicapt_BR
dc.subjectInfrareden
dc.subjectSol-gelpt_BR
dc.subjectEspectroscopia : Infravermelhopt_BR
dc.subjectStationary phaseen
dc.subjectAnálise térmicapt_BR
dc.subjectSol-gelen
dc.subjectThermal stabilityen
dc.titleXerogel p-anisidinapropilsílica : estudo da estabilidade térmica e da resistência à lixiviação com solventespt_BR
dc.title.alternativeP-anisidinepropylsilica xerogel. Thermal stability and resistance to leaching by solvents en
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000333953pt_BR
dc.type.originNacionalpt_BR


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