Navegação Ciências Exatas e da Terra por Assunto "Ultravioleta extrema"
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Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography
(2014) [Artigo de periódico]Although extreme ultraviolet (EUV) lithography is being considered as one of the most promising nextgeneration lithography techniques for patterning sub-20 nm features, the development of suitable EUV resists remains one ...