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    • Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography 

      Singh, Vikram; Satyanarayana, Vardhineedi Sri Venkata; Batina, Nikola; Reyes, Israel Morales; Sharma, Satinder Kumar; Kessler, Felipe; Scheffer, Francine Ramos; Weibel, Daniel Eduardo; Ghosh, Subrata; Gonsalves, Kenneth E. (2014) [Journal article]
      Although extreme ultraviolet (EUV) lithography is being considered as one of the most promising nextgeneration lithography techniques for patterning sub-20 nm features, the development of suitable EUV resists remains one ...