• Nitrogen implantation into amorphous carbon films: sims and positron annihilation analyses 

      Freire Junior, Fernando Leite; Franceschini, Dante F.; Achete, Carlos A.; Baumvol, Israel Jacob Rabin; Brusa, R.S.; Mariotto, Gino; Canteri, R. (1996) [Artículo de periódico]
      Hard amorphous hydrogenated carbon films deposited by self-bias glow discharge were implanted at room temperature with 70 keV-nitrogen ions at fluences between 2.0 and 9.0 x 10 16 N/cm2. The implantation energy was chosen ...