Browsing Exact and Earth Sciences by Subject "E-beam lithography"
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Performance evaluation of nonchemically amplified negative tone photoresists for e-beam and EUV lithography
(2014) [Journal article]Although extreme ultraviolet (EUV) lithography is being considered as one of the most promising nextgeneration lithography techniques for patterning sub-20 nm features, the development of suitable EUV resists remains one ...