Navegação Artigos de Periódicos por Assunto "Oxinitreto de silicio"
Resultados 1-2 de 2
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Atomic transport across the interfaces during the formation of ultrathin silicon oxide/nitride/oxide films
(1998) [Artigo de periódico]The redistribution of O and N during the final, thermal oxidation in dry O2 step in the formation of ultrathin silicon oxide/nitride/oxide dielectric films ~ONO! was investigated using isotopic tracing and depth profiling ... -
Isotopic tracing during rapid thermal growth of silicon oxynitride films on Si in O2, NH3, and N2O
(1997) [Artigo de periódico]We performed isotopic tracing of O, N, and H during rapid thermal growth of silicon oxynitride films on silicon in two different sequential, synergistic gas environments: O2, followed by NH3, then followed by N2O; and N2O, ...