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dc.contributor.authorPezzi, Rafael Perettipt_BR
dc.contributor.authorKrug, Cristianopt_BR
dc.contributor.authorGrande, Pedro Luispt_BR
dc.contributor.authorRosa, Elisa Brod Oliveira dapt_BR
dc.contributor.authorSchiwietz, Gregorpt_BR
dc.contributor.authorBaumvol, Israel Jacob Rabinpt_BR
dc.date.accessioned2016-05-24T02:10:50Zpt_BR
dc.date.issued2008pt_BR
dc.identifier.issn0003-6951pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/141710pt_BR
dc.description.abstractAn analytical approach to ion energy loss distributions capable of simplifying medium energy ion scattering MEIS spectral analysis is presented. This analytical approach preserves the accuracy of recent numerical models that evaluate energy loss effects overlooked by standard calculations based on the Gaussian approximation. Results are compared to first principle calculations and experimental MEIS spectra from 0.2- to 1.5-nm-thick HfO2 films on Si, supporting the application of this analytical model for proton scattering in the kinetic energy range from 100 to 200 keV.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofApplied physics letters. Vol. 92, no. 16 (Apr. 2008), 164102, 3p.pt_BR
dc.rightsOpen Accessen
dc.subjectSilíciopt_BR
dc.subjectRetroespalhamentopt_BR
dc.subjectPerda de energia de particulaspt_BR
dc.titleAnalytical energy loss distribution for accurate high resolution depth profiling using medium energy ion scatteringpt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000637821pt_BR
dc.type.originEstrangeiropt_BR


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