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dc.contributor.authorBehar, Monipt_BR
dc.contributor.authorFadanelli Filho, Raul Carlospt_BR
dc.contributor.authorAbril Sanches, Isabelpt_BR
dc.contributor.authorGarcía-Molina, Rafaelpt_BR
dc.contributor.authorDenton, Cristian D.pt_BR
dc.contributor.authorNagamine, Luiz Carlos Camargo Mirandapt_BR
dc.contributor.authorArista, Nestorpt_BR
dc.date.accessioned2014-10-09T02:13:13Zpt_BR
dc.date.issued2009pt_BR
dc.identifier.issn1050-2947pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/104315pt_BR
dc.description.abstractThe electronic stopping power, S, of HfO₂ films for proton and alpha particle beams has been measured and calculated. The experimental data have been obtained by the Rutherford backscattering technique and cover the range of 120–900 and 120–3000 keV for proton and alpha particle beams, respectively. Theoretical calculations of the energy loss for the same projectiles have been done by means of the dielectric formalism using the Mermin energy loss function—generalized oscillator strength (MELF-GOS) model for a proper description of the HfO₂ target on the whole momentum-energy excitation spectrum. At low projectile energies, a nonlinear theory based on the extended Friedel sum rule has been employed. The calculations and experimental measurements show good agreement for protons and a quite good one for alpha particles. In particular, the experimental maximums of both stopping curves (around 120 and 800 keV, respectively) are well reproduced. On the basis of this good agreement, we have also calculated the inelastic mean-free path IMFP and the stopping power for electrons in HfO₂ films. Our results predict a minimum value of the IMFP and a maximum value of the S for electrons with energies around 120 and 190 eV, respectively.en
dc.format.mimetypeapplication/pdf
dc.language.isoengpt_BR
dc.relation.ispartofPhysical review. A. Atomic, molecular, and optical physics. New York. Vol. 80, no. 6 (Dec. 2009), 062901, 8 p.pt_BR
dc.rightsOpen Accessen
dc.subjectFisica atomica e molecularpt_BR
dc.subjectRetroespalhamento rutherfordpt_BR
dc.subjectEfeitos de feixes de elétronspt_BR
dc.subjectEfeitos de prótonspt_BR
dc.subjectPerda de energia de particulaspt_BR
dc.subjectCompostos de háfniopt_BR
dc.subjectFilmes finospt_BR
dc.titleEnergy loss of proton, [alpha] particle, and electron beams in hafnium dioxide filmspt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000732394pt_BR
dc.type.originEstrangeiropt_BR


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