In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k
dc.contributor.author | Costa, Jose Antonio Trindade Borges da | pt_BR |
dc.contributor.author | Vasconcellos, Marcos Antonio Zen | pt_BR |
dc.contributor.author | Teixeira, Sergio Ribeiro | pt_BR |
dc.contributor.author | Scherer, Claudio | pt_BR |
dc.contributor.author | Baibich, Mario Norberto | pt_BR |
dc.date.accessioned | 2014-09-23T02:12:23Z | pt_BR |
dc.date.issued | 1992 | pt_BR |
dc.identifier.issn | 0163-1829 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/103619 | pt_BR |
dc.description.abstract | We report on the dose dependence of the in sítu electrical resistivity of a thin-film NiAl alloy under 120-keV-Ar-ion irradiation at 77 K. The results show two different behaviors. First, the values of resistivity increase, exhibiting a maximum, and then, for higher doses, the electrical resistivity decreases down to saturation. Our results are interpreted in terms of simple composite models that assume local transformation of the solid by successive ion impacts. | en |
dc.format.mimetype | application/pdf | pt_BR |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | Physical review. B, Condensed matter. New York. Vol. 45, no. 17 (May 1992), p. 9626-9628 | pt_BR |
dc.rights | Open Access | en |
dc.subject | Implantacao ionica | pt_BR |
dc.subject | Filmes finos | pt_BR |
dc.subject | Condutividade | pt_BR |
dc.subject | Radiacao ionica | pt_BR |
dc.subject | Intermetalicos | pt_BR |
dc.subject | Mistura por bombardeamento ionico | pt_BR |
dc.title | In situ electrical resistivity of thin-film beta-nial under ar irradiation at 77 k | pt_BR |
dc.type | Artigo de periódico | pt_BR |
dc.identifier.nrb | 000055738 | pt_BR |
dc.type.origin | Estrangeiro | pt_BR |
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