• Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO/sub 2/ films annealed in O/sub 2/ 

      Bastos, Karen Paz; Morais, Jonder; Miotti, Leonardo; Pezzi, Rafael Peretti; Soares, Gabriel Vieira; Baumvol, Israel Jacob Rabin; Hegde, R.I.; Tseng, Hsing-Huang; Tobin, Phil J. (2002) [Artigo de periódico]
      Composition, atomic transport, and chemical reaction were investigated following annealing in O2 of ultrathin HfO2 films deposited on Si substrates thermally nitrided in NO. The as-prepared thin film composition was ...