• Direct etching of SiO2 and Al2O3 by 900-keV gold ions 

      Glass, Gary A.; Dias, Johnny Ferraz; Dymnikov, Alexander D.; Houston, Louis M.; Rout, Bibhudutta (2009) [Artigo de periódico]
      We report the direct etching of Al2O3 and SiO2 using 900-keV Au+ ions. 2000-mesh Cu grids were employed as masks using two different configurations: 1 the Cu mesh was placed on top of each insulator separately and independent ...