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dc.contributor.authorPezzi, Rafael Perettipt_BR
dc.contributor.authorWallace, Robert M.pt_BR
dc.contributor.authorCopel, Matthewpt_BR
dc.contributor.authorBaumvol, Israel Jacob Rabinpt_BR
dc.date.accessioned2016-07-27T02:18:00Zpt_BR
dc.date.issued2005pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/144010pt_BR
dc.format.mimetypeapplication/pdf
dc.language.isoengpt_BR
dc.relation.ispartofAIP conference proceedings. New Yorkpt_BR
dc.rightsOpen Accessen
dc.subjectCircuitos integradospt_BR
dc.subjectDepth profilingen
dc.subjectEletrônicapt_BR
dc.subjectMedium energy ion scatteringen
dc.subjectResonant nuclear reaction analysisen
dc.titleHigh resolution profiling using ion scattering and resonant nuclear reactionspt_BR
dc.typeTrabalho completo publicado em eventopt_BR
dc.contributor.eventCharacterizations and Metrology for ULSI Technology ( 2005 : Richardson, Texas)pt_BR
dc.identifier.nrb000560098pt_BR
dc.type.originEstrangeiropt_BR


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