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dc.contributor.authorMonteiro, W.A.pt_BR
dc.contributor.authorSchreiner, Wido Herwigpt_BR
dc.contributor.authorBaumvol, Israel Jacob Rabinpt_BR
dc.contributor.authorDionisio, Paulo Henriquept_BR
dc.contributor.authorTeixeira, Sergio Ribeiropt_BR
dc.contributor.authorMosca Junior, Dante Homeropt_BR
dc.date.accessioned2014-05-17T02:06:45Zpt_BR
dc.date.issued1991pt_BR
dc.identifier.issn0021-8979pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/95343pt_BR
dc.description.abstractThe thermal evolution of reactively sputtered iron nitride thin films has been investigated by xray diffraction, Mössbauer conversion electron spectroscopy, transmission electron microscopy, and magnetic measurementsT. he results show that, independentlyo f the original nitrogen content of the films, a similar composition of the end products after the 500 °C annealings is reached, being all composed of α-Fe plus y-Fe4 N in a wide range of relative proportions. The magnetic characteristics, however, are different depending on the nitrogen content of the as-depositedf ilms.en
dc.format.mimetypeapplication/pdf
dc.language.isoengpt_BR
dc.relation.ispartofJournal of Applied Physics. Woodbury. Vol. 69, no. 1 (Jan. 1991), p. 261-267pt_BR
dc.rightsOpen Accessen
dc.subjectIntermetalicospt_BR
dc.subjectFilmes finospt_BR
dc.titleThe evolution of sputtered iron nitride thin films under thermal treatmentpt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000055143pt_BR
dc.type.originEstrangeiropt_BR


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