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dc.contributor.authorGasperini, A. A. M.pt_BR
dc.contributor.authorMalachias, A.pt_BR
dc.contributor.authorFabbris, Gilberto Fernandes Lopespt_BR
dc.contributor.authorKellermann, Guinterpt_BR
dc.contributor.authorGobbi, Angelo Luizpt_BR
dc.contributor.authorAvendaño Soto, E.pt_BR
dc.contributor.authorAzevedo, Gustavo de Medeirospt_BR
dc.date.accessioned2014-03-26T01:50:56Zpt_BR
dc.date.issued2012pt_BR
dc.identifier.issn0021-8898pt_BR
dc.identifier.urihttp://hdl.handle.net/10183/89685pt_BR
dc.description.abstractThe formation of GeSi nanoparticles on an SiO2 matrix is studied here by synchrotron-based techniques. The shape, average diameter and size dispersion were obtained from grazing-incidence small-angle X-ray scattering data. X-ray diffraction measurements were used to obtain crystallite sizes and composition via resonant (anomalous) measurements. By using these techniques as input for extended X-ray absorption fine structure analysis, the local composition surrounding the Ge atoms is investigated. Although the results for each of the methods above are commonly analyzed separately, the combination of such techniques leads to an improved understanding of nanoparticle structural and chemical properties. Crucial indirect parameters that cannot be quantified by other means are accessed in this work, such as local strain, the possibility of forming core–shell structures, the fraction of Ge atoms diluted in the matrix (not forming nanoparticles), the amorphous and crystalline Ge fractions, and the relative population of nanoparticles with single and multiple crystalline domains.en
dc.format.mimetypeapplication/pdfpt_BR
dc.language.isoengpt_BR
dc.relation.ispartofJournal of Applied Crystallography. Copenhagen. Vol. 45, no. 1 (Feb. 2012), p. 71-84pt_BR
dc.rightsOpen Accessen
dc.subjectMateriais semicondutorespt_BR
dc.subjectCrescimento de semicondutorespt_BR
dc.subjectNanopartículaspt_BR
dc.subjectAnálise químicapt_BR
dc.subjectEspalhamento de raios-xpt_BR
dc.subjectEstrutura fina estendida de absorção de raios x (EXAFS)pt_BR
dc.subjectCompostos de silíciopt_BR
dc.titleInvestigation of indirect structural and chemical parameters of GeSi nanoparticles in a silica matrix by combined synchrotron radiation techniquespt_BR
dc.typeArtigo de periódicopt_BR
dc.identifier.nrb000820137pt_BR
dc.type.originEstrangeiropt_BR


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