Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples
dc.contributor.author | Vasconcellos, Marcos Antonio Zen | pt_BR |
dc.contributor.author | Lima, Saulo Cordeiro | pt_BR |
dc.contributor.author | Hinrichs, Ruth | pt_BR |
dc.date.accessioned | 2011-06-08T06:00:10Z | pt_BR |
dc.date.issued | 2010 | pt_BR |
dc.identifier.issn | 1517-7076 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/29434 | pt_BR |
dc.description.abstract | Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest. | en |
dc.format.mimetype | application/pdf | pt_BR |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | Revista Matéria. Rio de Janeiro: Coppe/UFRJ, 2010. Vol. 15, n. 2 (jun. 2010), p. 299-302 | pt_BR |
dc.rights | Open Access | en |
dc.subject | Glow discharge | en |
dc.subject | Ciência dos materiais | pt_BR |
dc.subject | Titânio | pt_BR |
dc.subject | Nitride | en |
dc.subject | Hardness | en |
dc.subject | Difração de raios X | pt_BR |
dc.title | Hardness evaluation, stoichiometry and grain size of titanium nitride obtained with plasma nitriding on Ti-6AI-4V samples | pt_BR |
dc.type | Artigo de periódico | pt_BR |
dc.identifier.nrb | 000761324 | pt_BR |
dc.type.origin | Nacional | pt_BR |
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