Navegação Engenharias por Autor "Suprun-Belevich, Yu."
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Strain development and damage accumulation during neon ion implantation into silicon at elevated temperatures
Cima, Carlos Alberto; Boudinov, Henri Ivanov; Souza, Joel Pereira de; Suprun-Belevich, Yu.; Fichtner, Paulo Fernando Papaleo (2000) [Artigo de periódico]The development of mechanical strain and accumulation of damage in silicon single crystals implanted with Ne ions to doses in the range of 0.1–1.0 x1017 cm-² at temperatures from 200 to 600 °C were investigated employing ...