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Co/ag multilayer film : role of annealing on the magnetic properties
dc.contributor.author | Schelp, Luiz Fernando | pt_BR |
dc.contributor.author | Tosin, Giancarlo | pt_BR |
dc.contributor.author | Carara, Marcos Andre | pt_BR |
dc.contributor.author | Baibich, Mario Norberto | pt_BR |
dc.contributor.author | Gomes, Affonso Augusto Guidão | pt_BR |
dc.contributor.author | Schmidt, Joao Edgar | pt_BR |
dc.date.accessioned | 2016-05-10T02:06:50Z | pt_BR |
dc.date.issued | 1992 | pt_BR |
dc.identifier.issn | 0003-6951 | pt_BR |
dc.identifier.uri | http://hdl.handle.net/10183/140555 | pt_BR |
dc.description.abstract | Co( 15 A)/Ag(60 A) multilayers produced by electron beam deposition on a 50 A chromium buffer layer over a Si( 111) wafer have been studied by magnetoresistance, saturation magnetization, coercivity, and anisotropy. Annealing at various temperatures produces striking effects on the observed physical properties, such as an improvement on the value of the magnetoresistance associated to a “back-diffusion” process in the Co/Ag interfaces. This leads one to believe that interface roughness is indeed most important to understanding the connection between giant magnetoresistance and antiferromagnetic coupling, as well as the behavior of coercivity vs interface anisotropy in these materials. | en |
dc.format.mimetype | application/pdf | pt_BR |
dc.language.iso | eng | pt_BR |
dc.relation.ispartof | Applied physics letters. New York. Vol. 61, n. 15 (Oct. 1992), p. 1858-1860 | pt_BR |
dc.rights | Open Access | en |
dc.subject | Física da matéria condensada | pt_BR |
dc.subject | Implantação de íons | pt_BR |
dc.subject | Interfaces | pt_BR |
dc.subject | Magnetorresistência | pt_BR |
dc.subject | Magnetização | pt_BR |
dc.title | Co/ag multilayer film : role of annealing on the magnetic properties | pt_BR |
dc.type | Artigo de periódico | pt_BR |
dc.identifier.nrb | 000056035 | pt_BR |
dc.type.origin | Estrangeiro | pt_BR |
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